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High Resolution, Large Field of View, Long Working Distance Microscope





Technology Source: TechLink

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About the Technology:

The U.S. Air Force seeks to commercialize through patent licensing a microscopy/lithography technology that corrects for a variety of aberrations in lenses and mirrors. This allows for the use of inexpensive, imperfect optics as the objective lens to image objects with sub-micron resolution. This invention has been reduced for 2D but is equally applicable for 3D imaging

Features/Benefits

Holographic correction: Resolution performance equivalent to objective lenses that cost much, much more than the imperfect lenses/mirrors that can be used here

Long working distances: Flexible viewing conditions including in situ, real time observations

Large field of view: Ease of operation: no longer necessary to toggle lenses of different magnifications or stitching various scenes together to get the full picture

De-magnification and photo-reduction: The system can be used in reverse to project a demagnified image for lithography or to focus laser light for micro-machining

Status:

U.S. patent 7,471,430- Holographic Image Corrector - available for licensing

Peer-reviewed articles

Inventor can be available for discussions and consultations

Point of Contact:		Contact Location:
Joan Wu-Singel phone: (406)994-7705 email: Jwu-singel@montana.edu		Bozeman, MT

Documents:		Links:
High Resolution Microscope.pdf		TechLink